AQA · A-Level · Physics

    Course version: 7408 · Version from Sept 2016

    Use in N-channel, enhancement mode only is required.

    Full specification wording

    MOSFET (metal-oxide semiconducting field-effect transistor) (A-level only): Use in N-channel, enhancement mode only is required.

    The specification restricts MOSFET work to the N-channel enhancement type, so you must recognise its structure and explain why it needs a positive gate-source voltage to conduct.

    Checked against the AQA 7408 specification (opens in a new tab) on .

    • Point 3 of 3
    • 4 key terms

    Study notes

    From the checked teaching notes for this specification point.

    The idea

    The specification restricts MOSFET work to the N-channel enhancement type, so you must recognise its structure and explain why it needs a positive gate-source voltage to conduct. In an N-channel device the source and drain are n-type regions in a p-type substrate; a thin insulating oxide layer separates the gate. With V_GS below the threshold voltage no conducting channel exists, so drain current is negligible. Raising V_GS above threshold attracts electrons to the surface, forming an induced n-channel that connects source and drain, and I_D then rises with V_DS. You should be able to describe this in terms of field effect and charge carriers, sketch the transfer characteristic, and use the device as a voltage-controlled switch or amplifier.

    What earns the marks

    • Identifies the source and drain as n-type regions formed within a p-type substrate, with a metal or polysilicon gate insulated by a thin oxide layer.
    • Explains that a positive gate-source voltage above the threshold value induces an n-type conducting channel between source and drain.
    • States that below threshold no channel exists, so the drain current is effectively zero and the device is off.
    • Describes the MOSFET as a voltage-controlled device because the gate voltage, not a gate current, controls the drain current.
    • Uses the transfer characteristic to show drain current rising once V_GS exceeds the threshold voltage.
    • Applies the device as a switch, identifying the off state below threshold and the on state above it.

    Common mistakes and how to put them right

    • Treating the gate as a forward-biased junction that draws steady current.

      Put it right: The oxide insulates the gate, so gate current is negligible and control is by electric field.

    • Assuming any positive gate voltage switches the device on; the correction is that conduction begins only above the threshold voltage.

    • Confusing enhancement behaviour with depletion behaviour by expecting a channel at zero gate-source voltage.

      Put it right: An enhancement MOSFET requires a gate-source voltage above threshold to form its channel.

    Exam tips

    • Sketch the transfer characteristic with V_GS on the horizontal axis and I_D on the vertical axis, marking the threshold voltage clearly.
    • Use the phrase voltage-controlled when contrasting the MOSFET with a bipolar transistor, and link it to the insulated gate.
    • When describing switching, state the gate-source voltage condition for each state rather than saying simply on or off.

    Try the lesson

    The start of the MOSFET (metal-oxide semiconducting field-effect transistor) (A-level only): Use in N-channel, enhancement mode only is required. lesson, made from checked teaching notes for this specification point.

    Have a go first

    An N-channel enhancement mode MOSFET has a threshold voltage of +2.0 V. Which of the following gate-source voltages would result in a conducting channel?

    Listen

    The specification restricts MOSFET work to the N-channel enhancement type, so you must recognise its structure and explain why it needs a positive gate-source voltage to conduct. In an N-channel device the source and drain are n-type regions in a p-type substrate; a thin insulating oxide layer separates the gate. With V_GS below the threshold voltage no conducting channel exists, so drain current is negligible. Raising V_GS above threshold attracts electrons to the surface, forming an induced n-channel that connects source and drain, and I_D then rises with V_DS. You should be able to describe this in terms of field effect and charge carriers, sketch the transfer characteristic, and use the device as a voltage-controlled switch or amplifier. A strong answer earns marks for these points. Identifies the source and drain as n-type regions formed within a p-type substrate, with a metal or polysilicon gate insulated by a thin oxide layer. Explains that a positive gate-source voltage above the threshold value induces an n-type conducting channel between source and drain. States that below threshold no channel exists, so the drain current is effectively zero and the device is off. Describes the MOSFET as a voltage-controlled device because the gate voltage, not a gate current, controls the drain current. A common slip: Treating the gate as a forward-biased junction that draws steady current. Instead, the oxide insulates the gate, so gate current is negligible and control is by electric field. Exam tip: Sketch the transfer characteristic with V_GS on the horizontal axis and I_D on the vertical axis, marking the threshold voltage clearly.

    See it

    A top-down flowchart. The top node, 'N-channel enhancement MOSFET', branches to two structure nodes: 'Source and drain: n-type regions in p-type substrate' and 'Gate insulated by thin oxide layer'. The oxide node leads to 'Voltage-controlled: gate voltage, not gate current, controls drain current'. Separately, 'V_GS below threshold' leads to 'No conducting channel', which leads to 'Drain current negligible: device off'. Also, 'V_GS above threshold' leads to 'Electrons attracted to surface', which leads to 'Induced n-channel connects source and drain', which leads to 'Drain current rises with V_DS: device on'.
    It shows the structure of the N-channel enhancement MOSFET and how the gate-source voltage determines whether the device is off or on.

    Key words

    Say what each word means before you turn the card.

    Threshold voltage

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    Induced n-channel

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    Voltage-controlled device

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    Enhancement MOSFET

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    See every definition
    Threshold voltage
    The gate-source voltage above which electrons are attracted to the surface, forming an induced n-channel that connects source and drain.
    Induced n-channel
    A conducting channel formed between source and drain when a positive gate-source voltage above threshold attracts electrons to the surface.
    Voltage-controlled device
    A device in which the gate voltage, not a gate current, controls the drain current, because the oxide insulates the gate.
    Enhancement MOSFET
    A device that requires a gate-source voltage above threshold to form its channel, so no channel exists at zero gate-source voltage.

    Label the diagram

    Some boxes have lost their names. Pick the right name for each number.

    The diagram again, with 3 boxes numbered instead of named. A top-down flowchart. The top node, 'N-channel enhancement MOSFET', branches to two structure nodes: 'Source and drain: n-type regions in p-type substrate' and 'Gate insulated by thin oxide layer'. The oxide node leads to 'Voltage-controlled: gate voltage, not gate current, controls drain current'. Separately, 'V_GS below threshold' leads to 'No conducting channel', which leads to 'Drain current negligible: device off'. Also, 'V_GS above threshold' leads to 'Electrons attracted to surface', which leads to 'Induced n-channel connects source and drain', which leads to 'Drain current rises with V_DS: device on'.
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